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Preparation And Research of Ferroelectric Properties of Fabricated Thin Film by doping La and Nd to Bi_4Ti_3O_(12)

机译:掺杂La和Nd至Bi_4Ti_3O_(12)制备和研究制造薄膜铁电性能

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Ferroelectric thin films Bi_(3.25)La_(0.75)Ti_3O_(12),Bi_(3.15)Nd_(0.85)Ti_3O_(12) andBi_(3.15)(La_(0.5)Nd_(0.5))_(0.85)Ti_3O_(12) of A-site substitution of Bi_4Ti_3O_(12) were fabricated by sol-gel method in the paper. X-ray diffraction pattern shows the prepared thin films exhibit a highly random orientation with predominantly (117) and (001) orientation. Pr values of Bi_(3.25)La_(0.75)Ti_3O_(12) , Bi_(3.15)Nd_(0.85)Ti_3O_(12) and Bi_(3.15)(La_(0.5)Nd_(0.5))_(0.85)Ti_3O_(12) thin films were respectively 13.14μC/cm2, 20.65μC/cm2 and 21.23μC/cm2 at the voltage of 10V.FE-SEM shows that the BNT thin film has a dense and homogeneous microstructure without any crack. The BNT thin film thickness is about 300nm.
机译:铁电薄膜Bi_(3.25)LA_(0.75)TI_3O_(12),BI_(3.15)ND_(0.85)TI_3O_(12)ANDBI_(3.15)(LA_(0.5)ND_(0.5))_(0.85)TI_3O_(12)通过纸质中的溶胶 - 凝胶法制造了Bi_4Ti_3O_(12)的现场替代。 X射线衍射图案显示制备的薄膜具有高度随机取向,主要(117)和(001)取向。 PR值的Bi_(3.25)LA_(0.75)TI_3O_(12),BI_(3.15)ND_(0.85)TI_3O_(12)和BI_(3.15)(LA_(0.5)ND_(0.5))_(0.85)TI_3O_(12 )薄膜分别为10V.FE-SEM的电压下的13.14μC/ cm2,20.65μC/ cm2和21.23μc/ cm2,表明BNT薄膜具有致密且均匀的微观结构而没有任何裂缝。 BNT薄膜厚度约为300nm。

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