High Brightness NGL Multiplexed EUV Light Source for EUV Interferometer, Metrology Inspection - (PPT)

摘要

To support pilot line operation and EUVL transition into HVM, EUV actinic metrology tools will be required for blank inspection, aerial image measurements and patterned mask defects review. The EUV sources for these metrology tool requires high brightness, moderate power and small etendue to match the projection magnification and illumination field size. NANO-UV is delivering a new generation of EUV light source with an intrinsic photon collector, the i-SoCoMo concept, where an impulse micro discharge plasma source is integrated to a photon collector based on an active plasma structure. Extensive numerical modelling has provided basic numbers to select the optimal regime for tin and xenon based source operation. The highly ionized xenon plasma in the presence of fast electrons demonstrates a unique added conversion efficiency. We present here experimental results from CYCLOPS BE-16, a commercial unit incorporating the i-SoCoMo technology, as well as performance of a 2nd generation i-SoCoMo product, "with early experiences of operating 12 such sources in a multiplexed configuration, in the HYDRA -12 design. From these designs, a family of specially configured source products is being introduced to address the mask metrology needs.