Block Copolymers on a Physically or Chemically Patterned Substrate

摘要

Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram.