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A capacitive pressure sensor using hybrid silicon-glass structure for hermetic wafer level packaging

机译:一种用于密封晶片级包装的混合硅 - 玻璃结构的电容式压力传感器

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A design of barometric capacitive pressure sensor is presented in this paper, which is compatible with the standard CMOS process, and a new wafer level packaging is used to seal the vacuum cavity with a glass-silicon hybrid wafer which has a certain pattern. The electrodes of the sensor are leaded out by through silicon via (TSV) technology from back side of the silicon substrate. Mechanical characteristics of the sensor are analyzed by ANSYS. The initial gap of both electrodes formed the capacitor is 2 µm, and the size of the square membrane is 700 µm. The simulation results show the sensitivity of the sensor is 2.84fF/hPa, and the nonlinearity of the device is less than 1.1% over a dynamic range 700–1100 hPa. It is shown that the device is suitable to be used in measuring the barometric pressure.
机译:本文提出了气压电容压力传感器的设计,其与标准CMOS工艺兼容,并且新的晶片水平包装用于用具有特定图案的玻璃 - 硅混合晶片密封真空腔。传感器的电极通过硅衬底的后侧通过硅通孔(TSV)技术而引出。传感器的机械特性由ANSYS分析。形成电容器的两个电极的初始间隙是2μm,方形膜的尺寸为700μm。仿真结果表明,传感器的灵敏度为2.84FF / HPA,而且设备的非线性在动态范围内小于1.1%的动态范围700-1100 HPA。结果表明,该装置适用于测量气压。

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