Fabrication of SiC-Based Ceramic Patterns via Soft Lithography of Polymeric Precursors

摘要

The high temperature stable SiC and SiCN ceramic patterns down to 230nm thick were fabricated by a micromolding in capillaries (MIMIC) method as one of the soft lithography techniques, and subsequent curing prior to removal of PMDS the mold and pyrolysis at 800 deg C in Ar atmosphere. As the molds were used to transfer the relief structures, the effect of various processing parameters on the morphology was investigated to obtain the non-cracked, well-defined ceramic pattern structures. Eventually, when the relief structure of the ceramic pattern was less than 2 mu m thick, it produced the defect-free micro-sclae pattern in the both cured and pyrolyzed patterns. Moreover, PDMS mold materials with a different rigidity were tested for the nanosclae patterns, and the physical and chemical demolding methods were also comparatively applied to the cured polymer patterns. The prepared samples were determined using TGA and SEM.