The development of new processes for depositing thin organic films has seen a renewed interest due to an increased demand for nanoelectronic devices. Tools for producing these devices, such as advanced lithographic patterning, often require ultrathin films with a high degree of compositional homogeneity. Molecular layer deposition (MLD) is a promising method for creating films with these qualities. By using an alternating sequence of self-saturating reactions, MLD can produce conformal films with a high degree of control over the composition and thickness. In a series of studies by our group, photoresist films were grown using MLD by incorporating acid-labile groups into an MLD-grown polyurea chain. The inclusion of photoacid generators was demonstrated both as a soaked-in additive as well as a polymer-bound reactive group. These films show potential as good photoresist materials, with some designs exhibiting sensitivities of 30 μC/cm~2 with 100 kV electron beam exposure, and a line resolution of sub-100 nm.
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