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A New Self-heat Modeling Approach for LDMOS Devices

机译:LDMOS设备的新自热建模方法

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The purpose of this research is to characterize and model the self-heating effect of n-channel Laterally Diffused Metal-Oxide-Semiconductor Field-Effect Transistors (LDMOS). In order to improve the accuracy and convergence of the self-heating (SH) simulations in DC, transient and small signal AC (S-Parameter) domains, a new SH model has been developed and implemented in Verilog-A version of BSIM4 model to simulate an LDMOS device. The new SH model does not require a separate thermal network. It has been verified with measurements in static DC, transient, and small signal AC (S-parameter). Excellent agreements between measured and simulated results have been obtained without sacrificing simulation speed and convergence performance.
机译:该研究的目的是表征和模拟N沟道横向扩散金属氧化物半导体场效应晶体管(LDMOS)的自热效果。为了提高DC,瞬态和小信号AC(S参数)域的自加热(SH)模拟的精度和收敛,在Verilog-A版本的BSIM4模型中开发和实现了一种新的SH模型。模拟LDMOS设备。新的SH模型不需要单独的热网络。它已经通过静态DC,瞬态和小信号AC(S参数)进行了验证。在没有牺牲模拟速度和收敛性能的情况下获得了测量和模拟结果之间的良好协议。

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