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One-step chemical bath deposition of Cu2O flowers grown on ITO seed layer coated glass substrate

机译:在ITO种子层涂层玻璃基板上生长Cu2O花的一步化学浴沉积

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Here, the growth of Cu2O flowers on a glass substrate were successfully fabricated using one-step chemical bath deposition method at low growth temperature. These flowers were grown on ITO seed layers that were prepared on glass substrate by magnetron-frequency RF sputtering. The structure and surface morphology of the products of Cu2O flowers were characterized in detail using X-ray diffraction and microscopy of field emission scanning electron. Optical properties were examined through the ultraviolet/visible spectro-scopy. The results showed that the Cu2O flowers were uniformly formed on ITO seeds-coated glass substrate, grow in the cubic structure with film preferential (111) plane orientation, high transmittance, and good crystallinity. The value of band gap is approximately 2.53 eV. This study helps to be the basis for more research on the growth of Cu2O at low-temperature and low cost-effective substrate.
机译:这里,在低生长温度下使用一步化学浴沉积方法成功制造玻璃基板上的Cu2O花的生长。通过磁控频率RF溅射在玻璃基板上制备的ITO种子层上生长这些花。使用X射线衍射和场发射扫描电子的显微镜,详细描述了Cu2O花的产品的结构和表面形态。通过紫外/可见光光谱 - SCOPY检查光学性质。结果表明,Cu2O花朵在ITO种子涂覆的玻璃基板上均匀地形成,在膜优于(111)平面方向,高透射率和良好的结晶度的立方结构中生长。带隙的值约为2.53eV。该研究有助于成为在低温和低成本型基材上进行更多研究Cu2O生长的基础。

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