PROPERTIES OF ITO LAYERS DEPOSITED BY MAGNETRON SPUTTERING FOR SOLAR CELL APPLICATIONS: THE INFLUENCE OF DEPOSITION TEMPERATURE, SUBSTRATES AND POST-DEPOSITION TREATMENTS

摘要

The detailed study of the surface morphology and structural properties of Indium-Tin-Oxide (ITO) layers on the deposition temperature, type of the substrate and post-deposition hydrogen plasma treatment is performed. Atomic force microscopy (AFM), X-ray diffraction (XRD), ellipsometry and four point probe methods were used for the analysis. It is established that properties of ITO layers depend drastically on the type of the substrate and on the deposition temperature. Formation of granule-like metallic balls on the surface of ITO layers after hydrogen plasma treatment is observed. It is established that the ball formation has to be taken into account in case of exposition of ITO layers to hydrogen-containing plasma or in case of ITO deposition on a hydrogen containing layer (for instance on a-Si:H/Si heterojunction structures). The observed phenomenon is explained by the chemical reduction of indium and tin oxides to their corresponding metallic components.