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Rectifying characteristics and transport behavior of the La_(0.9)Hf_(0.1)MnO_3/Nb-doped SrTiO_3 heterojunction

机译:LA_(0.9)HF_(0.1)MNO_3 / NB掺杂SRTIO_3异质结的整流特性和传输行为

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La_(0.9)Hf_(0.1)MnO_3 (LHMO) films were grown on (001) SrTiO_3 (LHMO/STO) and (001) 0.7 percent Nd-doped STO (LHMO/STON) substrates under the same conditions by using pulsed laser deposition technique. The x-ray diffraction and rocking curve measurements demonstrated high epitaxy and good crystallinity obtained in our films. The curves of resistance versus temperature indicated that the as-grown LHMO film exhibits a paramagnetic-ferromagnetic transition at Curie temperature T_C. The LHMO/STON heterojunctions exhibited asymmetric current-voltage characteristics similar to those of traditional semiconductor junctions and a typical temperature-dependent rectifying property in a wide temperature range from 20 to 300 K. The diffusion voltage (V_d) of the junction decreases almost linearly with the decrease in temperature. At a negative bias voltage, the dependence of the junction resistance (VII) on temperature showed an insulator-metal transition in the vicinity of T_C, as the voltage decreased from -2 to -7 V. The results were discussed by considering the band diagram of LHMO/STON junction and the tunneling current through the junction.
机译:通过使用脉冲激光沉积在相同条件下(001)SRTIO_3(LHMO / STO)和(001)在(001)SRTIO_3(LHMO / STO)和(001)0.7%ND掺杂的STO(LHMO / STON)基板上,LA_(0.9)HF_(0.1)HF_(0.1)HF_(0.1)MNO_3(LHMO)薄膜技术。 X射线衍射和摇摆曲线测量显示在我们的薄膜中获得的高髁和良好的结晶度。抗性与温度的曲线表明,生长的LHMO膜在居里温度T_C上表现出顺磁 - 铁磁转变。 LHMO / StON异质功能表现出与传统半导体结的不对称电流 - 电压特性,以及在宽温度范围内的典型温度依赖性整流性能为20至300k。结的扩散电压(V_D)几乎线性减少降低温度。在负偏置电压下,结电阻(VII)对温度的依赖性在T_C附近显示了绝缘金属转变,因为电压从-2到-7 V降低。通过考虑带图来讨论结果通过交界处的LHMO / STON结和隧道电流。

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