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Comparison of High-Voltage 4H-SiC Insulated-Gate Bipolar Transistor (IGBT) and MOS-Gated Bipolar Transistor (MGT)

机译:高压4H-SIC绝缘栅双极晶体管(IGBT)和MOS门双极晶体管(MGT)的比较

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摘要

In this paper, the performance of high-voltage (10kV) 4H-SiC n- and p-channel IGBTs and n-channel MOS-Gated Bipolar Transistor (MGT) are investigated and compared using 2-dimensional numerical simulations. We have found that the MGT in SiC is not suitable for applications at high blocking voltages and the p-channel IGBT is a better choice because of a much higher conductivity modulation in the drift region.
机译:在本文中,研究了高压(10kV)4H-SiC N-和P沟道IGBT和N沟道MOS - 门控双极晶体管(MGT)的性能,并使用二维数值模拟进行比较。我们发现SiC中的MGT不适合在高封闭电压下的应用,并且P沟道IGBT是更好的选择,因为漂移区域中的更高的电导率调制。

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