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Processes of the formation of HgBr and HgCl excimer molecules in gas-discharge radiation sources

机译:气体排放辐射源中HgBr和HgCl准分子分子形成的方法

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The additional processes of excitation of B ~2 Σ _(12) - state of HgBr and HgCl excimer molecules in gas-discharge plasma on HgBr_2/HgCl_2/He and HgBr_2/HgCl_2/N_2/He mixtures have been investigated (together with dissociation of mercury dihalides by electronic shock, which is the basic process). The pumping of working mixtures was implemented by high-frequency (f= 1000 Hz) barrier and surface discharges of nanosecond duration (~100 ns), taking place simultaneously. The essential increase in the amplitude (up to 3 times), radiation pulse duration (up to 2 times) and their back edge (up to 15 times) has been revealed with the addition of molecular nitrogen in the HgBr_2/HgCl_2/He working mixture, and also the difference in value of amplitudes of the first, second and third pulses have been revealed. It has been established, that the change in temporary radiation parameters is caused by the transfer of energy from molecular nitrogen in metastable state A~3Σ~+_u, at collisions with molecules of mercury dihalides. One more additional process, increasing the amplitude of the second and third radiation pulses both in the HgBr_2/HgCl_2/He mixtures, and in the HgBr_2/HgCl_2/N_2/He mixtures is the excitation of the HgBr(X~2Σ~+_(1/2)) and HgCl(X~2Σ~`+_(1/2)) radicals in the B~2Σ~+_(1/2) - state by the electrons.
机译:研究了B〜2σ_(12) - HGBr_2 / HgCl_2 / He和HgBr_2 / HgCl_2 / N_2 / HHBr_2 / HgCl_2 / N_2 / HGBr血浆中HgBr和HgCl准分子分子的额外激发方法 - 已经研究了气体放电血浆和HgBr_2 / HgCl_2 / N_2 / HE混合物中的通过电子休克的汞二极管,这是基本过程)。通过高频(F = 1000Hz)屏障和纳秒持续时间(〜100ns)的表面放电来实现加工混合物的泵送,同时进行。在HGBR_2 / HGCL_2 / HE中加入分子氮,幅度(最多3次),辐射脉冲持续时间(最多2次)和后边缘(最多2次)的基本增加并且还揭示了第一,第二和第三脉冲的幅度的幅度的差异。已经建立,即临时辐射参数的变化是由在亚泊氮的分子氮的能量转移到亚汞,汞二卤化物分子的碰撞引起。另一个额外的过程,增加第二和第三辐射脉冲的混合物中的第二和第三辐射脉冲,并且在HgBr_2 / hgcl_2 / n_2 / he混合中是hgbr的激励(x〜2σ〜+( 1/2))和HGCL(x〜2σ〜`+ _(1/2))在B〜2σ〜+ _(1/2)中的自由基通过电子。

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