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Plasma inducted wafer arcing in back-end process and the impact on reliability

机译:等离子体在后端过程中电感弧电弧和对可靠性的影响

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摘要

Wafer arcing is a commonly existed phenomenon, leading to wafer yield loss and reliability failure. By removing contact process, we found arcing frequency increase sharply and behave repeatedly; furthermore, we found seal ring of chip would cause wafer edge metal stressed and had reliability problem for the first time. Subsequently, the methods to reduce the arcing frequency and improve reliability were then studied.
机译:晶圆电弧是一种常见的现象,导致晶圆屈服损失和可靠性故障。 通过去除接触过程,我们发现电弧频率急剧增加并反复表现; 此外,我们发现芯片的密封环将导致晶圆边缘金属强调并首次具有可靠性问题。 随后,研究了降低电弧频率和提高可靠性的方法。

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