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Random Instability Induced by Active Dissolution

机译:激活溶解诱导的随机稳定性

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摘要

With the nonequilibrium fluctuation theory, pitting process in the active state was examined: in the active state, anodic dissolution yields random irregular surface inside a pit. This type of morphology is quite different from that of the polishing-state pit, which is composed of hemispherical round hollows. Consequently, it was concluded that pit diameter is, as well as the polishing-state pit, determined by the asymmetrical fluctuations which result from strong specific adsorption of anions. On the other hand, the irregularity inside the pit is created by the symmetrical fluctuations arising from the variation of the amount of adsorbed ions. That is, the aggressive anions form a complex with metal, which accelerates irregular dissolution. In the polishing-state pit, passive film hinders the formation of the complex, so that the symmetrical fluctuations do not occur. As a result, only hemispherical pits are yielded by the asymmetrical fluctuations.
机译:利用非平衡波动理论,检查了活性状态的点蚀过程:在活性状态下,阳极溶解产生坑内随机不规则的表面。这种类型的形态与抛光状态坑的形态完全不同,它由半球形圆形空洞组成。因此,得出结论,凹坑直径是由不对称波动决定的凹坑直径,这是由强烈的对阴离子的特异性吸附产生的不对称波动。另一方面,凹坑内的不规则性由来自吸附离子量的变化产生的对称波动产生。也就是说,侵蚀性阴离子形成具有金属的复合物,其加速不规则溶解。在抛光状态坑中,被动膜阻碍了复合物的形成,从而不会发生对称波动。结果,仅通过不对称波动产生半球凹坑。

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