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Cathodoluminescence and transmission electron microscopy study of island formation on InAs/InP QW structures during growth interruptions

机译:阴极致发光和透射电子显微镜在生长中断期间岛地层岛地层形成研究

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摘要

A study on the effect of growth interruptions on InAs/InP strained quantum wells (QW) by cathodoluminescence (CL) at helium temperature and transmission electron microscopy (TEM) is reported. The samples are grown by chemical beam epitaxy (CBE) with and without growth interruptions of 15s at the second interface of the InAs-SQW. Previous photoluminescence measurements showed the formation of InAs large range roughness and/or islands up to 8-monolayers-thick during the interruption. To clarify the structure of the thickness fluctuation TEM and CL observations are performed. QW-islands are revealed by TEM planar view observations. The localized CL spectra, in concordance with the TEM observations, demonstrate that no InAs QWs are present between the island. Only some isolated InAs islands appear in the samples without growth interruption.
机译:据报道了对氦温度和透射电子显微镜(TEM)的阴极致发光(CL)对INAS / INP紧张量子孔(QW)对INAS / INP紧张量子孔(QW)的影响的研究。样品由化学束外延(CBE)生长,并且在INA-SQW的第二界面处具有15S的生长中断。以前的光致发光测量显示在中断期间形成ina的大范围粗糙度和/或岛的ins厚度。为了阐明厚度波动TEM的结构,并进行CL观察。 QW-Islands被TEM Planar查看观察结果透露。通过TEM观察的一致性地,局部CL光谱证明岛上没有存在INAS QW。只有一些孤立的Inas岛屿出现在样品中,没有增长中断。

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