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comparison between the effectiveness of corrosion inhibitors with distinctive molecular structures in film formation and corrosion inhibition of AA2024-T3

机译:腐蚀抑制剂在膜形成中具有独特分子结构的腐蚀抑制作用与AA2024-T3的腐蚀抑制作用

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Corrosion protection of structural aluminium alloys for aerospace and marine applications is ofparamount importance. This is commonly achieved through the use of corrosion inhibitingcompounds. Constraints such as potential health issues associated with exposure to conventionalchromate-based corrosion inhibitors have led to the development of low toxicity corrosion inhibitorsfor a wide range of industries. Although numerous studies have been carried out on evaluatinginhibitor performance and associated mechanisms, limited studies have been done onunderstanding the film-forming characteristics of inhibitors and their role in providing corrosionprotection.Aluminium alloy, AA2024-T3 is an alloy, widely used in aerospace applications, with copper as itsprimary alloying element. Previous studies have discovered that due to the high affinity of coppertowards sulphur, inhibitors with a sulphur-based ligand bond with the Cu-rich intermetallic particles[1,2]. This study will focus on two inhibitors with distinctive molecular structures that are known fortheir high corrosion inhibition efficiency for the protection of aluminium alloy, AA2024-T3. Keyaspects of the film-forming behavior of these selected inhibitors and the test methods used toevaluate the inhibitor-induced films in a 0.1 M chloride solution are to be presented. Film formationwas investigated and discussed by means of various electrochemical corrosion monitoringmethods such as linear polarisation resistance (LPR), potentiodyanmic scanning (PDS),electrochemical impedance spectroscopy (EIS) and potential hold (PH). In conjunction with thesetechniques, surface analysis techniques, atomic force microscopy (AFM), scanning electronmicroscopy (SEM) and x-ray photoelectron spectroscopy (XPS) were utilized to achieve a deeperunderstanding of the inhibitor-induced film forming mechanism in relation to how the inhibitorstructure could influence corrosion protection via film formation. In addition, as an importantinhibitor parameter, the persistence of the inhibitor-induced film will also be discussed.
机译:结构铝合金用于航空航天和海洋应用的腐蚀保护是 重中之重。这通常通过使用腐蚀抑制来实现 化合物。约束,例如与常规接触相关的潜在健康问题 铬酸盐基腐蚀抑制剂导致低毒性腐蚀抑制剂的发育 广泛的行业。虽然已经对评估进行了许多研究 抑制剂性能和相关机制,有限的研究已经完成 了解抑制剂的成膜特征及其在提供腐蚀方面的作用 保护。 铝合金,AA2024-T3是一种合金,广泛用于航空航天应用,用铜为其 主要合金元素。以前的研究发现,由于铜的高亲和力 致硫,抑制剂与硫基配体键,与富含C​​u的金属间颗粒 [1,2]。该研究将专注于两种具有众所周知的分子结构的抑制剂 它们对铝合金保护的高腐蚀抑制效率,AA2024-T3。钥匙 这些选定抑制剂的成膜行为的方面和用于的测试方法 展示抑制抑制剂诱导的薄膜在0.1米氯化物溶液中。成膜 通过各种电化学腐蚀监测研究和讨论 方法,如线性偏振电阻(LPR),挥发性anmic扫描(PDS), 电化学阻抗光谱(EIS)和电位保持(pH)。与这些相结合 技术,表面分析技术,原子力显微镜(AFM),扫描电子 显微镜(SEM)和X射线光电子能谱(XPS)用于达到更深 了解抑制剂诱导的膜形成机制与抑制剂的方式 结构可以通过成膜形成腐蚀保护。另外,作为一个重要的 抑制剂参数,还将讨论抑制剂诱导的膜的持久性。

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