Locating low-ohmic Variations in Resistance using Electron Beam Induced Voltage Imaging

机译：使用电子束感应电压成像定位电阻的低欧姆变化

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Locating ‘soft’ faults resulting from minor variations in resistance can be difficult using EBAC or RCI. Here, the authors explore the use of Electron Beam Induced Voltage for addressing these issues.

机译：使用EBAC或RCI很难定位由电阻的微小变化引起的“软”故障。在这里，作者探索了使用电子束感应电压来解决这些问题的方法。

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《IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits》|2020年|1-5|共5页
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Andrew J. Smith; Andreas Rummel; Matthias Kemmler; Klaus Schock; Stephan Kleindiek;
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Probes; Needles; Resistance; Electron beams; Electrical resistance measurement; Metals; Voltage measurement;

机译：探头;针;电阻;电子束;电阻测量;金属;电压测量;

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1. Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering [J] . Laurent Gallais, Jeremie Capoulade, Jean-Yves Natoli, Applied optics . 2008,第13期

机译：通过电子束沉积，反应性低压离子镀和双离子束溅射沉积的氧化f薄膜的抗激光损伤性
2. Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering [J] . L. Gallais, H. Krol, J.Y. Natoli, Thin Solid Films . 2007,第7a8期

机译：电子束沉积，离子辅助沉积，反应性低压离子镀和双离子束溅射沉积的二氧化硅薄膜的抗激光损伤性
3. Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars [J] . Satoshi Okada, Takahito Mukawa, Ryota Kobayashi, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2006,第6B期

机译：电子束和聚焦离子束诱导化学气相沉积柱之间杨氏模量对束加速电压的依赖性比较
4. High-voltage electron-beam-induced-current imaging of microdefects in laser diodes and MESFETs [C] . Hwang D.M., DeChiaro L., Wang M.C., Reliability Physics Symposium, 1994. 32nd Annual Proceedings., IEEE International . 1994

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5. In situ measurements of electron-beam-induced surface voltage of highly resistive materials. [D] . Hodges, Joshua. 2012

机译：高电阻材料的电子束感应表面电压的原位测量。
6. Non-rigid image registration to reduce beam-induced blurring of cryo-electron microscopy images [O] . Fatemeh Karimi Nejadasl, Manikandan Karuppasamy, Emily R. Newman, -1

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7. Evaluation of working length determination based on the analysis of cone-beam computed tomographic images and an electronic apex locator: a retrospective study* [O] . Krystyna Pietrzycka, Mateusz Radwański, Halina Pawlicka 2020

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8. Flash X-Ray (FXR) Accelerator Optimization Injector Voltage-Variation Compensation via Beam-Induced Gap Voltage. [R] . Ong, M. M. 2005

机译：闪光X射线（FXR）加速器优化注入器电压变化补偿通过光束引起的间隙电压。

Locating low-ohmic Variations in Resistance using Electron Beam Induced Voltage Imaging

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