首页> 外文会议>International Conference on Modern Power Systems >Chip structure metallization impact on thermally induced faults in power IC devices
【24h】

Chip structure metallization impact on thermally induced faults in power IC devices

机译:芯片结构金属化对功率IC器件中热诱导故障的影响

获取原文

摘要

IC’s power devices are widely used in many applications like switched-mode power supplies, power drivers for mechanical actuators, etc., being subjected to repetitive power pulses. The Active Power Cycling (APC) influences the reliability of IC’s, hence the failure rate. The failure mechanisms observed in MOSFETs power devices based on contacting clip technology [3] are solder fatigue and metallization layer degradation. The difference between the Coefficient of Thermal Expansion (CTE) of different materials can induce high deformations in chip metallization, like wrinkles at the top power metal layers. It is well known that the temperature swing is responsible for the IC’s degradation, but many other parameters e.g. geometrical dimensions, material properties etc., have an important impact too. This paper studies the impact of geometrical dimensions on thermal-induced stress and deformations by a contact clip on a typical MOSFET metalization structure.
机译:IC的功率器件广泛用于许多应用,如开关模式电源,机械致动器等的电力驱动器,用于重复的功率脉冲。 有源电力循环(APC)影响IC的可靠性,因此失败率。 在基于接触夹技术的MOSFET电力器件中观察到的故障机制[3]是焊接疲劳和金属化层劣化。 不同材料的热膨胀系数(CTE)之间的差异可以引起芯片金属化的高变形,如顶部功率金属层的皱纹。 众所周知,温度摆幅负责IC的劣化,但是很多其他参数。 几何尺寸,材料特性等也具有重要影响。 本文研究了几何尺寸对典型MOSFET金属化结构上的接触夹对热引起应力和变形的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号