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Structural enhancement of ZnO thin films by sol-gel process for photonic applications

机译:用于光子应用的溶胶-凝胶法增强ZnO薄膜的结构

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Zinc oxide (ZnO) thin film is grown on glass substrate by the sol-gel spin coating technique. The prepared film annealed at 450 °C. X-ray diffraction shows that the ZnO Film is polycrystalline with (002) preferential orientation. We have found the Surface roughness was minimum (12.4 nm) by atomic force microscopy. The optical band gap is found to be 3.12±0.01 eV by UV-visible Spectroscopy. The Wave guiding properties of the thin film has been also studied. The results indicate that our film is monomode at 632.8 nm with propagation optical loss estimated around 1.6 dB/cm.
机译:通过溶胶-凝胶旋涂技术在玻璃基板上生长氧化锌(ZnO)薄膜。所制备的膜在450℃下退火。 X射线衍射表明ZnO薄膜是具有(002)优先取向的多晶。通过原子力显微镜,我们发现表面粗糙度最小(12.4 nm)。通过紫外-可见光谱发现光学带隙为3.12±0.01eV。还研究了薄膜的波导特性。结果表明,我们的薄膜在632.8 nm处为单模,传播光学损耗估计为1.6 dB / cm。

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