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Consolidation of Copper-Copper Nitride Nanocomposite Powders via Warm Extrusion

机译:通过热挤压固结氮化铜铜纳米复合粉

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Copper nitride films prepared by sputtering have applications such as optical data storage material, insulation barriers in micro electronic devices and coatings for mechanical applications. The present study examines nanocomposites prepared by mechanical alloying of copper with copper nitride under nitrogen atmosphere, at room temperature, in order to establish a comparison with properties of Cu-N sputtered films. The powders were consolidated into bulk samples via warm extrusion at temperatures ranging from 300 to 500°C (0.42-0.64 T_f) after encapsulation without degassing. The as-milled powders and the extruded materials were studied using X-ray diffraction, optical microscopy, scanning and transmission electron microscopy and microhardness measurements. Also, the TEM observation of the extruded sample indicates a mean grain size of about 50 nm. This evidences a higher thermal stability of the as-milled powders and the advantage of using a fast consolidation process, at a relatively low temperature. Therefore, the consolidated material did not show the dramatic softening associated with recrystallization. The consolidation of nanostructured copper-copper nitride composite powders via warm extrusion, without major grain coarsening, was demonstrated.
机译:通过溅射制备的氮化铜膜具有诸如光学数据存储材料,微电子器件中的绝缘屏障以及用于机械应用的涂层的应用。本研究检测通过在氮气氛下用铜氮化物的机械合金化制备的纳米复合材料,在室温下,为了建立与Cu-N溅射膜的性质的比较。通过在不脱气的情况下,通过温度挤出通过温度挤出将粉末固化成批量样品。使用X射线衍射,光学显微镜,扫描和透射电子显微镜和微硬度测量研究了AS-MICHED粉末和挤出材料。而且,挤出样品的TEM观察表明平均晶粒尺寸为约50nm。这证明了AS-MICRED粉末的较高热稳定性以及使用快速固结过程的优点在相对较低的温度下。因此,综合材料没有显示与重结晶相关的剧烈软化。证实了通过温热挤出的纳米结构铜 - 铜氮化物复合粉末的固结,无需重大晶粒粗化。

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