首页> 外文会议>Laser-Induced Damage in Optical Materials: 1996 >Laser-induced damage of fused silica at 355 and 1064 nm initiated at aluminum contamination particles on the surface
【24h】

Laser-induced damage of fused silica at 355 and 1064 nm initiated at aluminum contamination particles on the surface

机译:激光诱导的熔融石英在355和1064 nm处的损坏是由表面上的铝污染颗粒引起的

获取原文
获取外文期刊封面目录资料

摘要

Abstract: Contamination particles of controlled size and shape were deposited onto 1.14 cm thick fused silica windows by sputtering Al through a mask. The particles were 1 $mu@m thick circular dots, 10 to 250 $mu@m in diameter. Al shavings were also deposited on the windows to investigate the effects of particle-substrate adhesion. The silica windows were then illuminated repetitively using a 3-ns, 355 nm and an 8.6-ns, 1064 nm laser. The tests were conducted at near normal incidence with particles on the input and output surfaces of the window. During the first shot, a plasma ignited at the metal particle and damage initiated on the fused silica surface. The morphological features of the damage initiated at the metal dots were very reproducible but different for input and output surface contamination. FOr input surface contamination, minor damage occurred where the particle was located; such damage ceased to grow with the removal of contaminant material. More serious damage was initiated on the output surface and grew to catastrophic proportions after few shots. Output surface contaminants were usually ejected on the initial shot, leaving a wave pattern on the surface. No further damage occurred with subsequent shots unless a shot cracked the surface; such behavior was mostly observed at 355 nm and occasionally for large shavings at 1064 nm. The size of the damaged area scaled with the size of the particle. The onset of catastrophic damage on the output surface occurred only when particles exceeded a critical size. The damage behavior of the sputtered dots was found to be qualitatively similar to that of the shavings. The artificial contamination technique accelerated the study by allowing better control of the test conditions. !20
机译:摘要:通过掩模通过掩模溅射Al沉积受控尺寸和形状的污染粒子。颗粒为1 $ MU @ M厚的圆点,直径为10至250 $ MU @ m。 AL削片也沉积在窗户上,以研究粒子基板粘附的影响。然后使用3-ns,355nm和8.6ns,1064nm激光重复地照亮二氧化硅窗口。测试在靠近正常入射率的近似进行,窗口的输入和输出表面上。在第一次拍摄期间,在金属颗粒上点燃的等离子体和在熔融二氧化硅表面上引发的损坏。在金属点发起的损伤的形态特征非常可再现但输入和输出表面污染的不同。为了输入表面污染,颗粒位于颗粒的次要损伤;这种损伤不再通过除去污染物而生长。在输出表面上启动了更严重的损坏,并在几张镜头后增长到灾难性比例。输出表面污染物通常在初始镜头上喷射,留下表面上的波纹。后续镜头不会发生进一步的损坏,除非射击裂开表面;这种行为在355纳米处大多观察到,偶尔为1064纳米的大刨花。受损区域的尺寸缩放,尺寸为粒子的尺寸。仅当粒子超过临界大小时,输出表面上的灾难性损坏的发作才会发生。发现溅射点的损伤行为与刨花的质量类似。通过允许更好地控制测试条件,人工污染技术加速了研究。 !20

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号