Zinc-tin oxide films were deposited by dual magnetron alternating current (AC) sputtering from rotary cathodes using both metallic and ceramic targets. The ceramic targets can alleviate the hysteresis for more stable sputtering and allow high deposition rates with respect to the poisoned metal targets with significantly lower oxygen addition. Film properties were found to be influenced by the oxygen partial pressure in the chamber as well as the post-annealing conditions. A finite amount of oxygen addition combined with O~- ion bombardment during deposition is beneficial in avoiding sub-oxides with trapped tail states, thereby improving film conductivity and transparency. At suitable oxygen flow, the optical properties from the different targets are comparable with refractive indices of n~2.05 and extinction coefficients of k~0.002. Film stresses before and after 600°C heat treatment are similar with no distinct film crystallization, suggesting that compatible film performance can be expected in tempered low-E glass applications.
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