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Raman Spectroscopy Study of Low Energy He~+ Ion Irradiation Effect in Graphene Transferred onto SiO_2*

机译:拉曼光谱研究对石墨烯的低能量He〜+离子辐照效应转移到SiO_2 *

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摘要

We studied the low energy (5.4 keV) He~+ ion irradiation effect on the properties of chemical vapor deposited graphene transferred onto SiO_2/Si substrate. For a small dose density of 4 × 10~(12) He~+/cm~2, both the G and 2D bands in the Raman spectra exhibit blue-shift and the intensity ratio of the 2D and G peaks decreases. The intensity ratio of the D and G peaks increases a lot as the dose density is larger than 1.2 × 10~(13) He~+/cm~2. It suggests that before the formation of large amount of defects, low energy He~+ ion irradiation may induce charge-transfer doping in graphene due to the presence of polymer residues. Broad spatial distributions of the band shift and the intensity ratio indicate inhomogeneity of doping level in graphene.
机译:我们研究了低能量(5.4keV)HE〜+离子照射效果对转移到SiO_2 / Si衬底上的化学气相沉积石墨烯的性质。对于小剂量密度为4×10〜(12)He〜+ / cm〜2,拉曼光谱中的G和2D带都表现出蓝色偏移,并且2D和G峰的强度比减小。随着剂量密度大于1.2×10〜(13)HE〜+ / cm〜2,D和G峰的强度比增加了大量。它表明,在形成大量缺陷之前,由于聚合物残基存在,低能量He〜+离子照射可能导致石墨烯中的电荷转移掺杂。频带偏移的宽空间分布和强度比表明石墨烯中掺杂水平的不均匀性。

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