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Micropatterning microlens arrays fabricated by a femtosecond laser wet etch process

机译:飞秒激光湿法刻蚀工艺制作的微图案微透镜阵列

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Microlens arrays with specially required micropatterns are highly desirable for digital optical processors, microimaging systems, optical photolithography as well as various biomedical imaging and detecting applications. However, realization of such devices efficiently remains technically challenging. Here, a facile and efficient route for large-area microlens arrays (MLAs) with programmable micropatterns is demonstrated. The fabrication process involves a femtosecond laser wet etch process combined with the replication process of hot embossing. Special arranged microlens arrays, including a doublet microlens array, a three-microlens group array, a four-microlens group array, and a six-petal-like microlens array as examples, were fabricated by this method. The fabricated MLAs exhibit excellent surface morphology quality and optical imaging properties. This presented technique provides an efficient way to flexibly design the size, shape and the arrangement of the MLAs by adjusting the process parameters such as the pulse energy, the number of shots etching time and the distribution of ablation-induced craters and Programming arrangement.
机译:对于数字光学处理器,微成像系统,光学光刻以及各种生物医学成像和检测应用,非常需要具有特殊要求的微图案的微透镜阵列。然而,有效地实现这样的设备在技术上仍然具有挑战性。在这里,展示了一种具有可编程微图案的大面积微透镜阵列(MLA)的便捷途径。该制造过程涉及飞秒激光湿法蚀刻过程,并结合了热压花的复制过程。通过这种方法,制造了包括双合体微透镜阵列,三微透镜组阵列,四微透镜组阵列和六瓣状微透镜阵列在内的特殊布置的微透镜阵列。制成的MLA表现出优异的表面形态质量和光学成像性能。该提出的技术提供了一种有效的方式,可以通过调整工艺参数(例如脉冲能量,喷丸蚀刻时间的数量以及烧蚀引起的弹坑的分布和编程设置)来灵活地设计MLA的尺寸,形状和布置。

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