首页> 外文会议>European Photovoltaic Solar Energy Conference and Exhibition >INVESTIGATION OF INDIUM-BASED CHALCOGENIDE BUFFER LAYERS PREPARED BY CHEMICAL BATH DEPOSITION PROCESS FOR CIGS PHOTOVOLTAIC DEVICES
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INVESTIGATION OF INDIUM-BASED CHALCOGENIDE BUFFER LAYERS PREPARED BY CHEMICAL BATH DEPOSITION PROCESS FOR CIGS PHOTOVOLTAIC DEVICES

机译:CIGS光伏装置化学浴沉积工艺制备的铟基硫属化合物缓冲层的研究

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The buffer layers of indium-based chalcogenide compound semiconductor were deposited on the sodalimeglass substrates by the chemical bath deposition (CBD) process. The effects of pH values, acetic acidconcentrations, and thioacetamide concenrations on the surface morphologies and film compositions of In(S,O,OH)films were investigated. The as-deposited films containing indium sulfide, indium oxide, and indium hydroxide wereverified by X-ray photoelectron spectroscopy (XPS) analysis of binding energy spectra of indium and oxygen. Theindium-based buffer layers deposited by the CBD process were thus described as In(S,O,OH) films. The surfacemorphologies of In(S,O,OH) films were assessed by field emission scanning electron microscope (FESEM). Thesmooth surface morphologies of In(S,O,OH) films with a conformal coverage on the glass substrates were achievedby optimizing the pH values, acetic acid concentrations, and thioacetamide concentrations in the deposition bath. Thehexagonal and cubic crystal structure coexisted in the CBD In(S,O,OH) films. The bandgap energy of as-depositedIn(S,O,OH) films was determined from the optical absorption data, revealing the optical bandgap energy of around2.57eV.
机译:铟基硫族化物化合物半导体的缓冲层沉积在钠钠盐上 通过化学浴沉积(CBD)工艺处理玻璃基板。 pH值,乙酸的影响 浓度,硫代乙酰胺浓度对In(S,O,OH)的表面形貌和膜组成的影响 电影进行了调查。含有硫化铟,氧化铟和氢氧化铟的沉积膜为 通过X射线光电子能谱(XPS)分析证实了铟和氧的结合能谱。这 因此,将通过CBD工艺沉积的铟基缓冲层描述为In(S,O,OH)膜。表面 In(S,O,OH)薄膜的形貌通过场发射扫描电子显微镜(FESEM)进行评估。这 实现了在玻璃基板上保形覆盖的In(S,O,OH)膜的光滑表面形态 通过优化沉积浴中的pH值,乙酸浓度和硫代乙酰胺浓度。这 CBD In(S,O,OH)薄膜中共存六方和立方晶体结构。沉积态的带隙能 根据光吸收数据确定了In(S,O,OH)薄膜,揭示了 2.57eV。

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