首页> 外文会议>第五届先进材料与加工国际会议(Fifth International Conference on Advanced Materials and Processing ICAMP-5)论文集 >EFFECT OF AL CONTENT ON MICROSTRUCTURE AND PROPERTIES OF AN INTERMETALLIC Ni-Ti (Al) COMPOUND/Ni GRADED COATING DEPOSITED ON COPPER SUBSTRATE
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EFFECT OF AL CONTENT ON MICROSTRUCTURE AND PROPERTIES OF AN INTERMETALLIC Ni-Ti (Al) COMPOUND/Ni GRADED COATING DEPOSITED ON COPPER SUBSTRATE

机译:Al含量对沉积在铜基体上的金属间Ni-Ti(Al)化合物/ Ni梯度涂层的组织和性能的影响

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Copper and its alloys with high electrical and thermal conductivity are a group of widely used engineering materials in numerous applications. In order to improve the tribological properties of copper substrate, an electroplating nickel layer was firstly deposited on copper substrate, subsequently these electroplated specimens were treated by slurry pack cementation process at 900°C for 12 h using a slurry mixture composed of TiO2 as titanizing source, pure Al powder as aluminzing source and also a reducer for titanizing, an activator of NH4C1 and albumen (egg white) as cohesive agent. The effect of Al content on the microstructure and the properties of the coating has been studied. The results showed that an intermetallic Ni-Ti (Al) compound/Ni graded layer was formed on copper substrate after slurry pack cementation process. With the rise of Al content in slurry mixture, the microhardness of the graded coating increased and the friction coefficient decreased from 0.35 to 0.18, at the same time, the slurry pack process gradually transited from the titanizing process to an aluminizing one. Correspondingly the main phases of the coating were changed from Ni-Ti intermetallic compounds into Ni-Al ones.
机译:具有高电导率和导热率的铜及其合金是在许多应用中广泛使用的一组工程材料。为了提高铜基体的摩擦学性能,首先在铜基体上沉积了一层电镀镍层,然后使用TiO2组成的浆料混合物作为钛化源,对这些电镀试样在900°C下进行了浆包胶结处理12 h。 ,纯铝粉作为渗铝源,也是钛化的还原剂,是NH4Cl的活化剂和作为粘合剂的蛋白(蛋清)。研究了铝含量对涂层微观结构和性能的影响。结果表明,在浆体充填胶结过程中,在铜基体上形成了金属间化合物Ni-Ti(Al)/ Ni梯度层。随着浆料混合物中铝含量的增加,梯度涂层的显微硬度增加,摩擦系数从0.35降低至0.18,同时,浆料填充过程逐渐从钛化过程过渡到渗铝过程。相应地,涂层的主要相从Ni-Ti金属间化合物转变为Ni-Al相。

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