Revolutionary New Process for Producing Particle-Free DI Water Down to 0.065 Microns

摘要

This article discusses the critical importance of the quality of pure water to the microelectronics industry, the problems in achieving sufficient water purification as design rules shrink and circuit integration continues to escalate, the problems with current methods of water purification, and a new, point-of-use ultra purification technology which is based on electrostatic principles of particle removal. The article demonstrates the performance of this innovative positiveegative zeta potential filter technology with performance data and measurements and notes its application to a wide range of industries and products.