首页> 外文会议>Annual meeting of the American Society for Precision Engineering >PREPARATION OF TITANIUM NITRIDE - MOLYBDENUM DISULFIDE COMPOSITE THIN FILMS WITH LOW FRICTIONAL PROPERTIES
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PREPARATION OF TITANIUM NITRIDE - MOLYBDENUM DISULFIDE COMPOSITE THIN FILMS WITH LOW FRICTIONAL PROPERTIES

机译:低摩擦性能制备氮化钛 - 二硫化钼复合薄膜

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摘要

Titanium nitride (TiN) film is superior in hardness, adhesive strength to substrates and abrasion resistance. Therefore, the TiN film is used widely as a protective coating. However, friction coefficients of the TiN film are higher than those of diamond-like carbon (DLC) films [1]. In this study, the author tried to reduce the friction coefficient of sputtered TiN thin films by addition of molybdenum disulfide (MoS_2), which showed low frictional characteristics.
机译:氮化钛(锡)膜的硬度优异,粘合强度与基材和耐磨性。因此,锡膜广泛用于保护涂层。然而,锡膜的摩擦系数高于金刚石碳(DLC)膜[1]的摩擦系数。在本研究中,作者试图通过添加二硫化钼(MOS_2)来减少溅射锡薄膜的摩擦系数,这表明了低摩擦特性。

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