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Thickness dependence of morphology and third-order nonlinear optical characteristics of metal-phthalocyanine thin films prepared with different thicknesses on KBr substrate

机译:KBr衬底上不同厚度制备的金属酞菁薄膜的形貌厚度依赖性和三阶非线性光学特性

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摘要

The third-order nonlinearity of nonlinear optical materials is of great importance in achieving all-optical switching. However, the relationship between the morphology and third-order nonlinear optical characteristics of metal-phthalocyanine thin film is unclear. In this paper, the thickness dependence of the morphologies and the nonlinear optical properties of titanylphthalocyanine (TiOPc) and vanadyl-phthalocyanine (VOPc) thin films prepared on a KBr substrate are investigated by using UV/Vis spectra, X-ray diffraction (XRD), and third-order harmonics (TH) and second-order harmonics (SH) detected using the Maker fringe method. TiOPc and VOPc thin films having different thicknesses were prepared on a KBr substrate using a molecular beam epitaxy (MBE) method. From the Vis/UV spectra of VOPc thin films fabricated on KBr substrate, the VOPc thin film epitaxially grows until the thickness of 90nm and VOPc thin films that are thicker than 90 nm change to a pseudomorphic layer. In the incident angle dependence of TH intensity, the maximum TH intensity of the pseudomorphic layers is not proportional to the square of film thickness. This indicates that defects inside the pseudomorphic layers are closely related to the maximum TH intensity not being proportional to the square of film thickness. These defects may be due to the misfit between the VOPc and TiOPc molecules and the KBr substrate. On the other hand, within the thickness of the TiOPc thin films fabricated on KBr substrate, the TiOPc thin films mainly grow with epitaxy. However, the maximum TH intensity measured with the TiOPc thin film is lower than that of the VOPc thin film. This is related to the molecular packing density of VOPc thin film being larger than that of TiOPc thin film.
机译:非线性光学材料的三阶非线性对于实现全光切换非常重要。但是,金属酞菁薄膜的形态与三阶非线性光学特性之间的关系尚不清楚。本文利用紫外/可见光谱,X射线衍射(XRD)研究了KBr基体上钛氧基酞菁(TiOPc)和钒基酞菁(VOPc)薄膜的形貌厚度依赖性和非线性光学性质。 ,以及使用Maker条纹方法检测到的三次谐波(TH)和二次谐波(SH)。使用分子束外延(MBE)方法在KBr基板上制备了具有不同厚度的TiOPc和VOPc薄膜。根据在KBr衬底上制造的VOPc薄膜的Vis / UV光谱,外延生长VOPc薄膜,直到90nm的厚度,厚度大于90nm的VOPc薄膜变为假晶层。在TH强度的入射角依赖性中,假晶层的最大TH强度与膜厚的平方不成比例。这表明假晶层内部的缺陷与最大TH强度密切相关,最大TH强度与膜厚的平方不成比例。这些缺陷可能是由于VOPc和TiOPc分子与KBr衬底之间的不匹配造成的。另一方面,在KBr衬底上制造的TiOPc薄膜的厚度范围内,TiOPc薄膜主要随着外延生长。但是,用TiOPc薄膜测得的最大TH强度低于VOPc薄膜。这与VOPc薄膜的分子堆积密度大于TiOPc薄膜的分子堆积密度有关。

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