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Optically Induced Series Resistance and Microwave Properties of n+ np+ GaAs and Si IMPATT Diode

机译:n + np + GaAs和Si IMPATT二极管的光致串联电阻和微波特性

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The effect of laser radiation on the n+ side of the n+ np+ semiconductor junction structure of GaAs and Si IMPATT diode at X band has been studied. Following Gummel-Blue approach [1] and considering the experimental ionization parameters of GaAs [2] and Si [3], the present study predicts that the enhancement of optically induced leakage current increases the value of crucial series resistance with an overall degradation in the microwave negative resistance properties, but with an advantage of wider tuning range at 22 C of the diode. It is also observed that GaAs diode yields lower values of series resistance and higher values of negative conductance than its Si IMPATT counterpart at X band.
机译:研究了在X波段激光辐射对GaAs和Si IMPATT二极管的n + np +半导体结结构的n +侧的影响。遵循Gummel-Blue方法[1]并考虑了GaAs [2]和Si [3]的实验电离参数,本研究预测,光致泄漏电流的增加会增加关键串联电阻的值,而整体电阻会降低。具有微波负电阻特性,但具有在二极管22 C下更宽的调谐范围的优点。还观察到,在X波段,GaAs二极管的Si IMPATT二极管的串联电阻值较低,而负电导率的值较高。

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    《》|2007年|1-4|共4页
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    De; P.;

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