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A low forward drop high voltage trench MOS barrier Schottky rectifier with linearly graded doping profile

机译:具有线性渐变掺杂轮廓的低正向下降高压沟槽MOS势垒肖特基整流器

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A novel high voltage Schottky rectifier, called the graded doped trench MOS barrier Schottky (GD-TMBS) rectifier, is described in this paper. A linearly graded drift region doping profile is shown to result in a uniform electric field in the drift region, resulting in the ability to support blocking voltages proportional to the trench depth. Two-dimensional device simulations have shown that breakdown voltages of up to 200 V can be achieved with a very low forward drop of 0.54 V. The measured on-state drop of fabricated 60 V and 100 V GD-TMBS are about 30% less than those of conventional Schottky rectifiers. The reverse leakage currents of the GD-TMBS rectifiers are two orders of magnitude less when compared to the conventional Schottky barrier diode.
机译:本文介绍了一种新型的高压肖特基整流器,称为渐变掺杂沟槽MOS势垒肖特基(GD-TMBS)整流器。线性渐变的漂移区掺杂曲线显示为在漂移区中产生均匀的电场,从而能够支持与沟槽深度成正比的阻挡电压。二维器件仿真显示,在0.54 V的非常低的正向压降下,可以实现高达200 V的击穿电压。所制造的60 V和100 V GD-TMBS的实测通态压降比大约低30%。常规肖特基整流器。与传统的肖特基势垒二极管相比,GD-TMBS整流器的反向泄漏电流小两个数量级。

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