首页> 外文会议> >Influence of SrTiO/sub 3/ or Pt buffer layer on the formation of perovskite phase Pb/sub 1-x/La/sub x/(Zr/sub y/Ti/sub 1-y/)/sub 1-x/4/O/sub 3/ films prepared by pulsed laser deposition
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Influence of SrTiO/sub 3/ or Pt buffer layer on the formation of perovskite phase Pb/sub 1-x/La/sub x/(Zr/sub y/Ti/sub 1-y/)/sub 1-x/4/O/sub 3/ films prepared by pulsed laser deposition

机译:SrTiO / sub 3 /或Pt缓冲层对钙钛矿相Pb / sub 1-x / La / sub x /(Zr / sub y / Ti / sub 1-y /)/ sub 1-x / 4形成的影响/ O / sub 3 /通过脉冲激光沉积制备的薄膜

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Interdiffusion between layers in Pb/sub 1/-xLa/sub x/(Zr/sub 1/-yTi/sub y/)O/sub 3/(PLZT)/SrTiO/sub 3//Si thin films were studied. The structural profiles examined by grazing incident X-ray diffraction (GIXD) and the elemental profiles examined by secondary ions mass spectroscopy (SIMS) revealed that the SrTiO/sub 3/ buffer layer can effectively block the interdiffusion between PLZT and Si only when this layer has fully covered the Si substrates. The SrTiO/sub 3/ layer were proposed to grow islandwisely and did not form a continuous films when deposited for short interval, leaving behind a large proportion of uncoated Si surface. Serious interaction between Si and the subsequently deposited PLZT films was thus induced. However, pronounced film-to-substrate interaction did not lead to more marked Pb-loss at film's surface. By contrast, slower crystallization kinetics of the deposited species was proposed to be the factor that caused Pb re-vaporization.
机译:研究了Pb / sub 1 / -xLa / sub x /(Zr / sub 1 / -yTi / sub y /)O / sub 3 /(PLZT)/ SrTiO / sub 3 // Si薄膜中各层之间的相互扩散。通过掠入射X射线衍射(GIXD)检查的结构轮廓和通过二次离子质谱(SIMS)检查的元素轮廓显示,只有当该层时,SrTiO / sub 3 /缓冲层才能有效地阻止PLZT和Si之间的相互扩散已经完全覆盖了硅衬底。 SrTiO / sub 3 /层建议岛状生长,短时间沉积时不形成连续膜,留下大量未涂覆的Si表面。因此,引起了Si与随后沉积的PLZT膜之间的严重相互作用。但是,明显的膜与底物相互作用不会导致膜表面的Pb损失更为明显。相比之下,沉积物的较慢结晶动力学被认为是导致Pb再蒸发的因素。

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