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Fabrication and field emission characteristics of high density carbon nanotubes microarrays

机译:高密度碳纳米管微阵列的制备和场发射特性

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High density carbon nanotube field emitter arrays (CNT-FEA) in both triode and diode structures on Si were fabricated. The carbon nanotubes were synthesized using a microwave-heated CVD process. The emission image of a diode-type CNT-FEA demonstrated a brightness of /spl sim/1800 cd/m/sup 2/ and a homogeneous emission quality. The cross-sectional SEM image of a triode-type emitter showed that CNTs in triode structures were shorter and less dense than CNTs in the diode-type emitters, though almost identical growth conditions of CNTs were utilized. The rough surface morphology of the emitter zone indicated the formation of chromium-silicide that could enhance the conductivity of Si substrates. Emission characteristics of the triode CNT-FEA showed that with a 1-/spl mu/m SiO/sub 2/ as the spacer, very low operating voltage could be applied to the gate. Therefore, high density CNT field emitter arrays with low turn-on voltage and large emission current were successfully fabricated.
机译:在Si上的三极管和二极管结构中都制造了高密度碳纳米管场发射体阵列(CNT-FEA)。使用微波加热CVD工艺合成碳纳米管。二极管型CNT-FEA的发射图像显示出/ spl sim / 1800 cd / m / sup 2 /的亮度和均匀的发射质量。三极管型发射极的横截面SEM图像显示,尽管利用了几乎相同的CNT生长条件,但是三极管结构中的CNT比二极管型发射极中的CNT更短且密度更低。发射极区的粗糙表面形态表明形成了可增强Si衬底电导率的硅化铬。三极管CNT-FEA的发射特性表明,以1- / spl mu / m SiO / sub 2 /作为间隔物,可以将非常低的工作电压施加到栅极上。因此,成功地制造了具有低导通电压和大发射电流的高密度CNT场致发射器阵列。

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