Converting the waste mixture of sulfuric acid and hydrogen peroxide into a coagulant to treat wastewater from a semiconductor plant

摘要

We report a new method to convert the waste mixture of sulfuric acid and hydrogen peroxide used for cleaning silicon wafers into a coagulant, aluminum sulfate, to treat the wastewater discharged from a semiconductor plant using the reaction between the waste mixture and aluminum hydroxide. The coagulant produced has essentially the same coagulating efficiency as conventional aluminum sulfate.