MOCVD; vapour phase epitaxial growth; quantum well lasers; piezoelectric semiconductors; III-V semiconductors; optical fabrication; photoluminescence; X-ray diffractometers; transmission electron microscopy; indium compounds; gallium arsenide; aluminium compounds; metalorganic vapor phase epitaxy; semiconductor double confinement strained Piezoelectric InGaAs/GaAs/AlGaAs QW laser diode; MOVPE; laser fabrication; photoluminescence; X-ray diffractometry; transmission electron microscopy; optical characteristic; electrical characteristic; 1.0 to 1.1 micron; 293 to 298 K; InGaAs-GaAs-AlGaAs; GaAs;
机译:金属有机气相外延在(111)A GaAs上生长的应变压电InGaAs / GaAs量子阱的界面性质
机译:(111)A GaAs衬底上金属有机气相外延生长及GaAs / AlGaAs和InGaAs / GaAs量子阱结构的性质
机译:金属有机气相外延生长GaAs / GaInP和GaAs / AlGaAs量子阱的比较研究
机译:压电InGaAs / GaAs / Algaas量子井激光器在(111)通过金属蒸汽相外延产生GaAs
机译:基于在结构化衬底上生长的低阈值应变InGaAs / GaAs量子阱激光器的光电器件
机译:峰值波长控制的InGaAs / AlGaAs量子阱的分子束外延生长用于4.3μm中波长红外检测
机译:在Gaas衬底上通过金属有机化学气相沉积生长的InGaas / InGaasp / InGap量子阱激光二极管的界面结构
机译:有机金属气相外延生长的alInGaas / alGaas分离限制异质结构应变单量子阱二极管激光器