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Electrical stability of the organic-inorganic material with low-k dielectric constant deposited by ICPCVD method

机译：ICPCVD法沉积低k介电常数有机无机材料的电稳定性

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摘要

Electrical stability of the film for ultralarge scale integrated circuit (ULSI) multilevel interconnections is studied.

机译：研究了用于超大规模集成电路（ULSI）多级互连的薄膜的电稳定性。

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《》|2003年|p.409|共1页
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Oh; K.S.; Choi; C.K.;
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中图分类无线电电子学、电信技术;
关键词
organic-inorganic hybrid materials; dielectric thin films; plasma CVD coatings; permittivity; ULSI; integrated circuit interconnections; electrical stability; organic-inorganic material; low-k dielectric constant; ICPCVD method; ultralarge scale integrat;

机译：有机-无机杂化材料;介电薄膜;等离子CVD涂层;介电常数; ULSI;集成电路互连;电稳定性;有机-无机材料;低k介电常数; ICPCVD方法;超大规模集成;

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2. Materials with tunable low-k dielectric constant derived from functionalized octahedral silsesquioxanes and spherosilicates [J] . Eckstorff F., Zhu Y., Maurer R., Polymer: The International Journal for the Science and Technology of Polymers . 2011,第12期

机译：由功能化的八面体倍半硅氧烷和球形硅酸盐衍生的具有可调低k介电常数的材料
3. High resistivity and low dielectric constant amorphous carbon nitride films: application to low-k materials for ULSI [J] . Masami Aono, Shoji Nitta Diamond and Related Materials . 2002,第3a6期

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4. Electrical stability of the organic-inorganic material with low-k dielectric constant deposited by ICPCVD method [C] . Oh K.S., Choi C.K. International Conference on Plasma Science . 2003

机译：用ICPCVD方法沉积低k介电常数的有机无机材料的电稳定性
5. Electrical stability of metal/low dielectric constant material systems. [D] . Mallikarjunan, Anupama. 2002

机译：金属/低介电常数材料系统的电稳定性。
6. Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications [O] . Christopher E. Sunday, Karl R. Montgomery, Papa K. Amoah, -1

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7. Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 – ICPCVD [O] . Chang Sil Yang, Heon Ju Lee, Chi Kyu Choi 2015

机译：mTms / O2 - ICpCVD沉积低介电碳掺杂氧化硅薄膜的形成与特性
8. Electron Radiation Effects in Low-K Dielectric Materials [R] . Jenei, Z., Petkov, M. P., Asoka-Kumar, P., 2003

机译：低K介质材料中的电子辐射效应

Electrical stability of the organic-inorganic material with low-k dielectric constant deposited by ICPCVD method

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