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Evaluation of GaAs low noise and power MMIC technologies to neutron, ionizing dose and dose rate effects

机译:GaAs低噪声和低功率MMIC技术对中子,电离剂量和剂量率效应的评估

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An evaluation programme of Thomson CSF-TCS GaAs low noise and power MMIC technologies to 1 MeV equivalent neutron fluence levels, up to 1/spl times/10/sup 15/ n/cm/sup 2/, ionizing 1.17-1.33 MeV Co/sup 60/ dose levels in excess of 200 Mrad(GaAs) and dose rate levels reaching 1.89/spl times/10/sup 11/ rad(GaAs)/s is presented in terms of proper components and parameter choices, DC/RF electrical measurements and test methods under irradiation. Experimental results are explained together with drift analyses of electrical parameters that have determined threshold limits of component degradations. Modelling the effects of radiation on GaAs components relies on degradation analysis of active layer which appears to be the most sensitive factor. MMIC's degradation under neutron fluence was simulated from irradiated FET data. Finally, based on sensitivity of technological parameters, rad-hard design including material, technology and MMIC design enhancement is discussed.
机译:Thomson CSF-TCS GaAs低噪声和低功率MMIC技术的评估程序,其等效中子注量水平为1 MeV,最高1 / spl次/ 10 / sup 15 / n / cm / sup 2 /,电离1.17-1.33 MeV Co /超过200 Mrad(GaAs)的剂量不足60 /剂量水平,达到1.89 / spl次的剂量率水平/ 10 / sup 11 / rad(GaAs)/ s的剂量率水平是根据适当的组件和参数选择,DC / RF电气测量得出的以及在辐射下的测试方法。实验结果与电气参数的漂移分析一起进行了解释,这些参数已确定了组件退化的阈值极限。对辐射对GaAs组件的影响进行建模依赖于对活性层的降解分析,这似乎是最敏感的因素。 MMIC在中子注量作用下的降解是通过FET辐射数据模拟的。最后,基于技术参数的敏感性,讨论了抗辐射设计,包括材料,技术和MMIC设计增强。

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