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Contacts realization by rapid thermal annealing in multicrystalline silicon solar cells with special emphasis on metal influence

机译:多晶硅太阳能电池中通过快速热退火实现的接触,特别强调金属的影响

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To improve the quality of solar cell screen printed contacts, the authors have previously shown the capability to sinter the screen printed contacts by rapid thermal annealing (RTA) instead of commercial sintering; they have also noticed that the commonly used TiO/sub 2/ coating deposited by spray enhances the quality of the contact either with classical annealing or RTA. The aim of the present work is to analyse the metal influence on either front or back contacts realization by RTA on Polix p type multicrystalline silicon subsequently phosphorus diffused. The screen printed contact was replaced by the chosen metal dot obtained by evaporation. The authors have studied: Al/TiO/sub 2/; Ag/Al/TiO/sub 2/; Cu/Al/TiO/sub 2/; Pt/Al/TiO/sub 2/ and Cu/Cr/TiO/sub 2/. The RTA treatments were carried out at various temperatures and annealing time in an Ar ambience. The quality of the contacts are analysed from I-V characteristics, and possible diffusions of metallic species are characterized by SIMS experiments.
机译:为了提高太阳能电池丝网印刷触点的质量,作者先前已经展示了通过快速热退火(RTA)而不是商业烧结来烧结丝网印刷触点的能力。他们还注意到通过喷涂沉积的常用TiO / sub 2 /涂层可提高经典退火或RTA的接触质量。本工作的目的是分析金属对通过RTA在随后磷扩散的Polix p型多晶硅上实现正面或背面接触的影响。将丝网印刷的触点替换为通过蒸发获得的所选金属点。作者研究了:Al / TiO / sub 2 /; Ag / Al / TiO / sub 2 /; Cu / Al / TiO / sub 2 /; Pt / Al / TiO / sub 2 /和Cu / Cr / TiO / sub 2 /。 RTA处理是在Ar气氛中的各种温度和退火时间下进行的。通过I-V特性分析触点的质量,并通过SIMS实验来表征金属物质的可能扩散。

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