Field averaging micro-lenses that synthesize highly uniform illumination in coherent EUV optical systems

摘要

Illumination uniformity in exposure tools is critical to several aspects of the extreme ultraviolet lithography development task. We've developed a field-averaging scanning-micro-lens system synthesizing robust, uniform illumination from non-uniform, high-coherence extreme ultraviolet sources enabling these sources to be used in applications requiring a high degree of illumination uniformity.