首页> 外文会议>International Federation for Heat Treatment and Surface Engineering Congress vol.2; 20041026-28; Shanghai(CN) >Deposition Technology and Microhardness of Electrochemical Deposited Ni-W Alloy Nanocrystalline
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Deposition Technology and Microhardness of Electrochemical Deposited Ni-W Alloy Nanocrystalline

机译:电化学沉积Ni-W合金纳米晶的沉积技术和显微硬度

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摘要

In this paper, a perpendicular experiment was conducted by using 4 key process parameters, such as concentration of sodium tungstate, current density, PH value and operating temperature, which have obvious influence on the electrodeposition of Ni-W alloy nanocrystalline. By extreme difference analysis, the influence of multi-factors on the deposition rate and microhardness and surface quality of the nanocrystalline alloy coatings was studied in detail. By further contrastive experiment, the influence of single-factor on the electrodeposition of Ni-W alloy nanocrystalline was also discussed, which will provide basis for the preparation of Ni-W alloy nanocrystalline.
机译:本文利用钨酸钠浓度,电流密度,PH值和工作温度等4个关键工艺参数进行了垂直实验,这些参数对Ni-W合金纳米晶的电沉积有明显的影响。通过极差分析,详细研究了多种因素对纳米晶合金涂层的沉积速率,显微硬度和表面质量的影响。通过进一步的对比实验,探讨了单因素对镍钨合金纳米晶电沉积的影响,为镍钨合金纳米晶的制备提供基础。

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