首页> 外文会议>International Conference on Silicon Carbide and Related Materials; 20050918-23; Pittsburgh,PA(US) >Vacancy defects induced by low energy electron irradiation in 6H and 3C-SiC monocrystals characterized by Positron Annihilation Spectroscopy and Electron Paramagnetic Resonance
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Vacancy defects induced by low energy electron irradiation in 6H and 3C-SiC monocrystals characterized by Positron Annihilation Spectroscopy and Electron Paramagnetic Resonance

机译:正电子ni没光谱和电子顺磁共振表征的6H和3C-SiC单晶中低能电子辐照引起的空位缺陷

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In this work we used Positron Annihilation Spectroscopy (PAS) and Electron Paramagnetic Resonance (EPR) to investigate the properties of vacancy defects produced by low energy electron irradiation. N-doped 3C-SiC and 6H-SiC monocrystals have been irradiated with electrons at different energies from 240keV to 900keV. EPR measurements show that Frenkel pairs V_(Si)~(3-)/Si are created in 6H-SiC when electron irradiation is performed at low energy (240-360 keV). EPR also indicates that the silicon displacement threshold energy is higher in 3C-SiC than in 6H-SiC. Moreover, PAS results show that the size and concentration of the vacancy defects decrease when the electron energy decreases for both polytypes. PAS detects vacancy defects in 240keV electron irradiated 3C-SiC, and the detection of the carbon vacancy is proposed.
机译:在这项工作中,我们使用正电子An没光谱(PAS)和电子顺磁共振(EPR)来研究低能电子辐照产生的空位缺陷的性质。用240keV至900keV的不同能量的电子辐照了N掺杂的3C-SiC和6H-SiC单晶。 EPR测量表明,当以低能量(240-360 keV)进行电子辐照时,在6H-SiC中会形成Frenkel对V_(Si)〜(3-)/ Si。 EPR还表明3C-SiC中的硅置换阈值能量高于6H-SiC中的硅置换阈值能量。此外,PAS结果表明,当两种多型体的电子能均降低时,空位缺陷的尺寸和浓度会降低。 PAS检测240keV电子辐照的3C-SiC中的空位缺陷,并提出了碳空位的检测方法。

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