Extreme ultra violet lithographic optical projection system design method using Code V lens module and generalized Gaussian constants

摘要

Since the conception of the Generalized Gaussian Constants, and its foundation the Gaussian Bracket, is a powerful tool in analyzing complex optical systems, though up until now it has seen use almost exclusive in designing zoom lens systems. This study investigates the correspondence of Generalized Gaussian Constants to optical system properties, and demonstrates a design method in particular for the reflective projection system in EUV lithography. The detailed four-mirror design is a proof of concept of the design method, and a more complex eight-mirror design demonstrates the capacity for higher design complexity.