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Deep defect states in narrow band-gap semiconductors

机译:窄带隙半导体中的深缺陷状态

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摘要

The nature of defect states associated with group III impurities (Ga, In, and Tl) in PbTe, a narrow band-gap semiconductor, has been studied within density functional theory and supercell model. For all three impurities (both substitutional-at the Pb site and interstitial-at the tetrahedral site), there is a hyper-deep defect state which lies about 0.5-1.0 eV below the valence band. It is a highly localized bonding state between the impurity s-orbital and the surrounding p-orbitals of the Te atoms. The corresponding anti-bonding state, denoted as the deep defect state, lies in the band-gap region. Its precise position vis-d-vis the conduction- and valence-band extrema controls the unusual properties exhibited by these defects.
机译:在密度泛函理论和超级电池模型中,已经研究了与窄带隙半导体PbTe中的III族杂质(Ga,In和Tl)相关的缺陷状态的性质。对于所有三种杂质(在Pb位点都是取代的,在四面体位点是间隙的),都有一个超深缺陷状态,其价带以下约0.5-1.0 eV。它是Te原子的杂质s轨道和周围的p轨道之间的高度局部键合状态。相应的抗粘结状态(称为深缺陷状态)位于带隙区域中。它相对于导带和价带极值的精确位置控制了这些缺陷所表现出的异常特性。

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