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UV emissions from an unipolar sub-μs pulsed DBD in He-Air mixtures

机译:空气混合物中单极性亚微秒脉冲DBD的紫外线发射

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UV emissions from NO,OH,N2,and N2+ between 200 nm and 400 nm from a fast-pulsed DBD in a He-air gas mixture (discharge gap:1 cm,pressure:100-750 Torr,voltage:2.5 –8 kV,sawtooth pulse:decaytime ~10 ns,frequency:1.5 –23 kHz,He air mixture with 3%-30%air)have been investigated.Thedischarge (~10 ns)studied here is ignited when a fast shortening pulse is applied.The main factor thatdetermines the spectral distribution is the amount of air admixed to the He.Because of the importance ofUV emissions around 250 nm in sterilization and biological applications,a calibrated photodiode wasused for absolute intensity measurements of the NO γ-band system in the 200 –280 nm range (~1μW/cm2 at a distance of 6cm from 1cm3 discharge,power input 60 W).
机译:快速脉冲DBD在氦气混合物中从NO,OH,N2和N2 +发出的UV辐射在200 nm至400 nm之间(放电间隙:1 cm,压力:100-750 Torr,电压:2.5 –8 kV ,锯齿脉冲:衰减时间〜10 ns,频率:1.5 –23 kHz,混合空气与3%-30%空气的混合气)已进行了研究。施加快速缩短脉冲时,点燃此处研究的放电(〜10 ns)。决定光谱分布的主要因素是与He混合的空气量。由于在杀菌和生物应用中250 nm附近的紫外线发射很重要,因此使用校准的光电二极管对200℃中的NOγ波段系统进行绝对强度测量。 280 nm范围(从1cm3放电到6cm的距离,约为1μW/ cm2,功率输入60 W)。

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  • 会议地点 Prague(CZ);Prague(CZ)
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    Department of physics and Engineering physics Stevens Institute of Technology Hoboken 07030 USA Institut für Niedertemperatur plasmaphysik (INP) Greifswald Germany;

    Institut für Niedertemperatur plasmaphysik (INP) Greifswald Germany;

    Department of physics and Engineering physics Stevens Institute of Technology Hoboken 07030 USA Center for Environmental Systems Stevens Institute of Technology Hoboken NJ 07030 USAPolytechnic University Brooklyn NY 11201 USA;

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