Pulsed plasma purification of water containingnon-degradable hazardous substances

摘要

An aqueous solution of phenol is exposed to pulsed-discharge plasma, and the decompositioncharacteristics of phenol are investigated for the different humidity and composition of the backgroundgas. It is likely that OH radicals produced by collision between electrons and gaseous water moleculesare responsible for the decomposition of phenol in the solution. Further, O3 and OH radicals producedby nitrogen molecules, excited in a metastable state, contribute to the phenol decomposition in pure O2and pure N2, respectively. In N2-O2 mixture, the decomposition rates of phenol stay at lower values,since NO reduces O3 concentration and inhibits the O3 production.