Deposition of thin TiOx films by surfatron generated plasma

摘要

The paper reports first results of TiOx thin films deposition using surfatron produced discharge ofjet type at reduced pressure. Plasma was created from Ar/O2 gas mixture flowing through a quartztube inserted into the surfatron cavity powered by MW source working at frequency 2.45 GHz.Plasma crated in this manner is sustained further downstream by surface wave and exiting thetube. The vapours of titanium isopropoxide were delivered into the plasma bulk nearby the quartztube outlet. The thin TiOx films were deposited on the heated glass substrates, distanced 8 mmfrom the end of the tube, up to 60 minutes. The results of deposited layers diagnostics - XRD,AFM and photoelectrochemical measurements - are discussed altogether as dependences on timeof deposition.