Generation Processes of O (3Pj) and O (1D2) Atomsin Oxygen and Krypton Mixture Surface Wave Excited Plasma

摘要

Generation processes of O atoms in the ground ( 3 Pj) and excited ( 1 D2) states in Oxygen and Kryptonmixture surface wave excited plasma (SWP) were investigated on the basis of quantitativemeasurement results of activated species in the SWP. In these quantitative measurements, O ( 3 Pj)and O ( 1 D2) atoms, metastable Krypton atom, and electron (Ne and Te) were measured by tunablevacuum ultraviolet laser absorption spectroscopy (VUVLAS), absorption spectroscopy withmicrodischarge hollow cathode lamp (MHCL), and Langmuir single probe, respectively. Fromresults estimated by these measurement results, it is supposed that electron impact dissociation andexcitation is dominant to generate the O atoms.