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Controlled Fabrication of Nanocomposite with Ni Deposition on the Template of SiO2 Particles and its Magnetic Property

机译:SiO2粒子模板上Ni沉积纳米复合材料的可控制备及其磁性能

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SiO2 /Ni nanocomposite is directly prepared from the silica particle by a controllable method through electroless metallization, which is different from the sol-gel technique. Its fabrication procedure is as follows: first the formation of ligating monolayer by a silane agent coupling with silica, then, binding Pd catalyst with its ligating group, finally, nano-sized Ni deposition occurs on the template. The metallic Ni particles are uniformly deposited on the silica, and they have a net or chain-like structure, just as the silica particles do. The composite inherent coercivity (iHc), saturated magnetization (MS), and residual magnetization (Mr) are 16.5, 10.0 and 1.00 respectively in the as-plated Ni. The chain-like structure causes stronger static magnetization interactions between Ni particles, resulting in a magnetic crystalline anisotropy and the higher iHc value.
机译:SiO2 / Ni纳米复合材料是通过可控方法通过化学镀直接从二氧化硅颗粒制备的,这与溶胶-凝胶技术不同。其制备过程如下:首先通过硅烷试剂与二氧化硅偶联形成连接单层,然后使Pd催化剂与其连接基团结合,最后在模板上发生纳米级Ni沉积。金属Ni颗粒均匀地沉积在二氧化硅上,并且与二氧化硅颗粒一样,它们具有网状或链状结构。 Ni镀层的复合固有矫顽力(iHc),饱和磁化强度(MS)和残余磁化强度(Mr)分别为16.5、10.0和1.00。链状结构导致Ni颗粒之间的静磁化作用更强,从而导致磁晶各向异性和更高的iHc值。

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