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Thermochromic VO2 thin film prepared by post annealing treatment of V2O5 thin film

机译:通过对V2O5薄膜进行后退火处理制备的热致变色VO2薄膜

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Thermochromic vanadium dioxide (VO2) exhibits a semi-conducting to metallic phase transition at about 68℃, involving strong variations in electrical and optical properties. A simple method was proposed to prepare VO2 thin films from easily gained V2O5 thin films. The detailed thermodynamic calculation was done and the results show that V2O5 will decompose to VO2 when the post annealing temperature reaches 550℃ at the atmospheric pressure of less than 0.06Pa. The initial V2O5 films were prepared by sol-gel method on fused-quartz substrates. Different post annealing conditions were studied. The derived VO2 thin film samples were characterized using X-ray diffraction and X-ray photoelectron spectroscopy. The electrical resistance and infrared emissivity of VO2 thin films under different temperatures were measured. The results show that the VO2 thin film derived from the V2O5 thin film annealed at 550℃ for 10 hours is pure dioxide of vanadium without other valences. It was observed that the resistance of VO2 thin film with thickness about 600nm can change by 4 orders of magnitude and the 7.5-14μm emissivity can change by 0.6 during the phase transition.
机译:热致变色二氧化钒(VO2)在约68℃时表现出从半导体到金属的相变,涉及电学和光学性质的强烈变化。提出了一种由容易获得的V2O5薄膜制备VO2薄膜的简单方法。进行了详细的热力学计算,结果表明,在大气压小于0.06Pa的条件下,当退火温度达到550℃时,V2O5会分解为VO2。初始的V2O5薄膜是通过溶胶-凝胶法在熔融石英衬底上制备的。研究了不同的后退火条件。使用X射线衍射和X射线光电子能谱表征衍生的VO 2薄膜样品。测量了不同温度下VO2薄膜的电阻和红外发射率。结果表明,在550℃下退火10小时的V2O5薄膜得到的VO2薄膜为纯净的钒的二氧化物。观察到在相变过程中,厚度约为600nm的VO2薄膜的电阻可以变化4个数量级,而7.5-14μm的发射率可以变化0.6。

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