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Interconnect BIST based new self-repairing of TSV defect in 3D-IC

机译:基于互连BIST的3D-IC中TSV缺陷的新自修复

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This paper presents an Interconnect Built-In Self-Repair (IBISR) strategies for Through Silicon Via (TSV) in three dimension integrated circuits (3D-IC). The proposed IBISR structure focuses on testing of specific defective TSV by using Interconnect BIST methodology. After interconnect test, the result giving will be delivered to the BISR structure for repairing TSV defects. Additionally, a parallel processing approach is presented of the proposed IBISR structure to up grit speed of operations of test and repair. Experimental results demonstrate that the proposed IBISR scheme can achieve the good performance in repair rate and yield with little area overhead penalty.
机译:本文提出了一种用于3D集成电路(3D-IC)中的硅穿孔(TSV)的互连内置自修复(IBISR)策略。提议的IBISR结构着重于通过使用互连BIST方法测试特定的缺陷TSV。经过互连测试后,给出的结果将被传送到BISR结构以修复TSV缺陷。另外,提出了一种提议的IBISR结构的并行处理方法,以提高测试和维修操作的速度。实验结果表明,所提出的IBISR方案在修复率和良率上都具有良好的性能,而面积开销损失很小。

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